Home » Products » Scanning Electron Microscopy » FIB-SEM (Ga and Xe plasma) » Tescan AMBER X for Material Science
FIB-SEM
Amber X from TESCAN is known for High throughput & large area FIB processing by enabling the fast milling of large cross-sections, up to 1 mm, as well as routine milling and polishing for sample preparation. The Xe plasma beam does minimum damage and doesn’t introduce contamination from implantation. It assures contamination-free microsample preparation for materials like aluminum can be achieved thanks to the inert nature of xenon ions. AMBER X’s BrightBeam™ SEM column enables field-free UHR imaging to expand high resolution characterization to materials that might otherwise be affected by the magnetic field below the final lens
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